Workshop on substrate preparation for epitaxy
May 22-24, 2018, Villeneuve d'Ascq (IEMN)
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Planning
Tuesday, May 22, 2018
| Time | Event | |
| 14:00 - 17:30 | Session: Surface preparation for heterogeneous integration | |
| 14:00 - 15:30 | Preparation of silicon substrates for heteroepitaxy - Charles Cornet (INSA Rennes) | |
| 15:30 - 16:00 | Coffee break | |
| 16:00 - 17:30 | Preparation of SOI substrate for hetero-integration - Christophe Figuet (SOITEC) |
Wednesday, May 23, 2018
| Time | Event | |
| 09:00 - 12:30 | Session: Substrate structuration by etching | |
| 09:00 - 10:30 | Si substrate preparation for the growth of SiGe nanostructures - Luc Favre (IM2NP) | |
| 10:30 - 11:00 | Coffee break | |
| 11:00 - 12:30 | III-V substrate preparation for epitaxial regrowth - Chantal Fontaine (LAAS) & Laurent Cerutti (IES) | |
| 12:30 - 14:00 | Lunch | |
| 14:00 - 15:30 | Session: Selective epitaxy of nitrides | |
| 14:00 - 15:30 | Selective area growth of Nitrides: technology and applications to light emitting structures - Guy Feuillet (CEA-LETI) | |
| 15:30 - 16:00 | Coffee break | |
| 16:00 - 18:30 | Session: Posters | |
| 20:00 - 23:00 | Dinner |
Thursday, May 24, 2018
| Time | Event | |
| 09:00 - 12:30 | Session: VLS and selective area growth of III-V materials | |
| 09:00 - 10:30 | Substrate preparation for VLS growth of nanowires - Sébastien Plissard (LAAS) | |
| 10:30 - 11:00 | Coffee break | |
| 11:00 - 12:30 | Substrate preparation for selective area growth of III-V nanostructures - Ludovic Desplanque (IEMN) | |
| 12:30 - 14:00 | Lunch |
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